Wilsonville, OR, United States of America

R Marshall Stowell


Average Co-Inventor Count = 5.2

ph-index = 10

Forward Citations = 408(Granted Patents)


Location History:

  • Lakeworth, FL (US) (2000)
  • West Linn, OR (US) (2004 - 2005)
  • Wilsonville, OR (US) (2004 - 2019)

Company Filing History:


Years Active: 2000-2019

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16 patents (USPTO):

Title: R Marshall Stowell: Innovator in Electroplating Technology

Introduction

R Marshall Stowell is a prominent inventor based in Wilsonville, OR (US), known for his significant contributions to the field of electroplating technology. With a total of 16 patents to his name, Stowell has made remarkable advancements that enhance the efficiency and effectiveness of electroplating processes.

Latest Patents

Stowell's latest patents include innovative technologies such as the Front Referenced Anode and the Electrofill Vacuum Plating Cell. The Front Referenced Anode patent describes apparatus and methods for electroplating that include anode supports with positioning mechanisms. These mechanisms maintain a consistent distance between the surface of the wafer and the consumable anode during plating, achieving greater uniformity control. The consumable anode features a plurality of through channels and at least one depression on its surface, designed to register with a protrusion on an anode assembly component. Fasteners can pass through the channels in the anode to attach it to a charge plate.

The Electrofill Vacuum Plating Cell patent relates to methods and apparatus for immersing a substrate in electrolyte under sub-atmospheric conditions. This innovation aims to reduce or eliminate bubble formation during immersion, which can lead to uneven plating times. The disclosed embodiments include various electrolyte recirculation loops equipped with pumps, degassers, sensors, and valves, allowing for quick immersion of the substrate and minimizing issues related to bubble formation.

Career Highlights

Stowell has built a successful career at Novellus Systems Incorporated, where he has been instrumental in developing cutting-edge electroplating technologies. His work has significantly impacted the semiconductor manufacturing industry, providing solutions that enhance production efficiency and product quality.

Collaborations

Throughout his career, Stowell has collaborated with notable colleagues, including Steven T Mayer and Avishai Kepten. These collaborations have fostered an environment of innovation and have contributed to the advancement of electroplating technologies.

Conclusion

R Marshall Stowell's contributions to electroplating technology through his patents and work at Novellus Systems Incorporated highlight his role as a leading inventor in the field. His innovations continue to shape the future of electroplating processes, ensuring greater efficiency and effectiveness in manufacturing.

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