Location History:
- San Jose, CA (US) (2015 - 2019)
- Campbell, CA (US) (2017 - 2023)
Company Filing History:
Years Active: 2015-2025
Title: Pierre Maillard: Innovator in SEU Detection and Correction
Introduction
Pierre Maillard is a notable inventor based in Campbell, CA (US). He has made significant contributions to the field of integrated circuits and has been awarded 14 patents throughout his career. His work primarily focuses on systems and methods for detecting and correcting single event upsets (SEUs).
Latest Patents
One of his latest patents is titled "System and method for SEU detection and correction." This invention describes a circuit designed to detect a single event upset (SEU). The circuit includes a latch with an output node, a first parity node, a second parity node, and correction circuitry that is configured to correct a single event upset at the output node using the first and second parity nodes. Another significant patent is "Designing single event upset latches," which presents an integrated circuit (IC) that includes an inverter with an input and an output, a clock transmission gate coupled to the output of the inverter, and a plurality of storage cells. The clock transmission gate is connected to each of the storage cells, which are arranged based on minimum spacing.
Career Highlights
Throughout his career, Pierre has worked with prominent companies such as Xilinx, Inc. and Advanced Micro Devices Corporation. His experience in these organizations has allowed him to develop innovative solutions in the field of electronics and integrated circuits.
Collaborations
Pierre has collaborated with several talented individuals, including Michael J. Hart and Praful Jain. Their combined expertise has contributed to the advancement of technology in their respective fields.
Conclusion
Pierre Maillard is a distinguished inventor whose work in SEU detection and correction has made a significant impact in the electronics industry. His numerous patents and collaborations highlight his dedication to innovation and excellence.