The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2020

Filed:

Aug. 23, 2018
Applicant:

Xilinx, Inc., San Jose, CA (US);

Inventors:

Michael J. Hart, Palo Alto, CA (US);

James Karp, Saratoga, CA (US);

Mohammed Fakhruddin, San Jose, CA (US);

Pierre Maillard, Campbell, CA (US);

Assignee:

XILINX, INC., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/06 (2006.01); H01L 27/02 (2006.01); H01L 49/02 (2006.01); H01L 29/73 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0635 (2013.01); H01L 27/0262 (2013.01); H01L 27/0288 (2013.01); H01L 28/20 (2013.01); H01L 29/7304 (2013.01); H01L 29/785 (2013.01);
Abstract

Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.


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