Grenoble, France

Pierre Bar

This inventor holds 27 USPTO granted patents and 8 published patent applications and 2 EPO patents, primarily in Integrated Circuit Fabrication. Top assignees: STMicroelectronics, Stmicroelectronics (Crolles 2) Sas, Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pierre Bar. Retrieved from https://idiyas.com/inventor/pierre-bar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 27 

% Patents Active = 66.7

 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Image Sensor Manufacturing
Etching Method
Integrated Circuit
Microfluidic Circuit
BAW Resonators
Through-Silicon Via
Three-Dimensional Structure
Coplanar Waveguide
Transmission Line
Electrical Connection
Capacitor Fabrication
Stress Field Determination
27 patents (USPTO):Explore Patents

Title: Innovations and Achievements of Pierre Bar in Grenoble, France

Introduction

Pierre Bar is an accomplished inventor based in Grenoble, France, with an impressive portfolio of 25 patents. His expertise primarily lies in the field of etching methods, which are crucial for various applications in semiconductor manufacturing. His innovative approaches have greatly contributed to advancements in the technology sector.

Latest Patents

Among Pierre Bar's most recent patents are significant methods for etching cavities within layered materials. One notable patent describes an etching method that forms a cavity traversing a stack of layers, specifically addressing excess thickness found in certain portions. This method involves a two-step process that includes both non-selective and selective etching techniques, optimizing material usage and precision.

Another recent patent elaborates on a method of etching a cavity in a stack of layers made from different materials. This involves creating a first etch mask with a specific opening to guide the etching process through layers, ensuring that the materials are selectively etched without compromising the integrity of the underlying layers. This innovative method exemplifies Pierre Bar's commitment to developing effective and efficient manufacturing processes.

Career Highlights

Pierre Bar has worked for notable companies in the semiconductor industry, including STMicroelectronics and STMicroelectronics (Crolles 2) SAS. His roles at these organizations have allowed him to actively contribute to pioneering technologies that enhance product functionality and performance.

Collaborations

Throughout his career, Pierre has collaborated with esteemed colleagues such as Sylvain Joblot and Jean-Francois Carpentier. These partnerships have fostered a creative environment where groundbreaking ideas and innovations can flourish, leading to advancements in their respective fields.

Conclusion

Pierre Bar's contributions to the world of patents and innovations, particularly in the field of etching methods, underscore his significance as an inventor. His work not only highlights his personal achievements but also advances technology in substantial ways, establishing him as a valuable figure in the semiconductor industry. With his ongoing efforts, we can expect further developments that will drive technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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