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San Jose, CA, United States of America

Peter Wai-Man Lee

This inventor holds 17 USPTO granted patents, primarily in Low Dielectric Materials. Top assignee: Applied Materials, Inc.. Active years: 2000-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter Wai-Man Lee. Retrieved from https://idiyas.com/inventor/peter-wai-man-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 17

% Patents Active = 64.7

Average Co-Inventor Count = 6.1

ph-index = 9

Forward Citations = 265(Granted Patents)

Location History:

Fremont, CA (US) (2003)
San Jose, CA (US) (2000 - 2010)

Company Filing History:

17 out of 14,502

Applied Materials, Inc.

Years Active: 2000-2010

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Areas of Expertise:

Low Dielectric Films

Plasma-Enhanced CVD

Silicon Carbide

Adhesion Improvement

Nano-Porous Copolymers

Thin Polymer Layers

Silicon Oxygen Carbide

Phosphosilicate Glass

CVD Processes

Dielectric Constant

Advanced Plasma Techniques

Chemical Vapor Deposition

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7745328 - Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) (2010-06-29),

2. 7465659 - Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) (2008-12-16),

3. 7459404 - Adhesion improvement for low k dielectrics (2008-12-02),

4. 7157384 - Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) (2007-01-02),

5. 7153787 - CVD plasma assisted lower dielectric constant SICOH film (2006-12-26),

6. 7030041 - Adhesion improvement for low k dielectrics (2006-04-18),

7. 7024105 - Substrate heater assembly (2006-04-04),

8. 6943127 - CVD plasma assisted lower dielectric constant SICOH film (2005-09-13),

9. 6911403 - Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics (2005-06-28),

10. 6838393 - Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide (2005-01-04),

11. 6709715 - Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds (2004-03-23),

12. 6663713 - Method and apparatus for forming a thin polymer layer on an integrated circuit structure (2003-12-16),

13. 6523494 - Apparatus for depositing low dielectric constant oxide film (2003-02-25),

14. 6486082 - CVD plasma assisted lower dielectric constant sicoh film (2002-11-26),

15. 6153540 - Method of forming phosphosilicate glass having a high wet-etch rate (2000-11-28),

Title: The Innovative Journey of Peter Wai-Man Lee

Introduction: Peter Wai-Man Lee, a visionary inventor based in San Jose, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Peter Wai-Man Lee holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of innovation.

Career Highlights: With a background in computer science and engineering, Peter Wai-Man Lee has had a successful career working for leading tech companies in Silicon Valley, where he honed his skills and expertise in developing cutting-edge technologies.

Collaborations: Throughout his career, Peter Wai-Man Lee has collaborated with top researchers, engineers, and scientists to bring his innovative ideas to life. His collaborative spirit has led to the creation of groundbreaking solutions that have revolutionized the tech industry.

Conclusion: Peter Wai-Man Lee's passion for innovation and his relentless pursuit of technological advancement have solidified his reputation as a pioneering inventor in the ever-evolving world of technology. His contributions continue to inspire future generations of inventors and shape the future of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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