Wijchen, Netherlands

Paulus Jacobus Maria Van Adrichem


Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Veldhoven, NL (2017 - 2019)
  • Wijchen, NL (2017 - 2023)

Company Filing History:


Years Active: 2017-2023

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Sure, here is an article about inventor Paulus Jacobus Maria Van Adrichem:

Title: Innovation in Patterning Processes: The Contributions of Paulus Jacobus Maria Van Adrichem

Introduction:

Paulus Jacobus Maria Van Adrichem, a talented inventor hailing from Wijchen, Netherlands, has made significant contributions to the field of patterning processes. With a total of 7 patents to his name, Van Adrichem's innovative work has greatly impacted the industry.

Latest Patents:

Van Adrichem's latest patents showcase his ingenuity in improving patterning processes. One of his recent inventions involves determining a subset of components of an optical characteristic of a patterning apparatus. This method aims to identify key contributors to the performance metric of a patterning process, ultimately enhancing the overall efficiency and accuracy of the process. Another patent focuses on patterning process improvement involving optical aberration, showcasing Van Adrichem's commitment to refining existing technologies.

Career Highlights:

Throughout his career, Van Adrichem has worked with prominent companies in the industry, including ASML Netherlands B.V. and Cymer, Inc. His expertise and innovative spirit have led to groundbreaking advancements in patterning processes, earning him a reputation as a respected figure in the field.

Collaborations:

Van Adrichem has collaborated with esteemed professionals such as Johannes Jacobus Matheus Baselmans and Jaqueline Borges Nicolau. Together, they have worked on cutting-edge projects that have pushed the boundaries of innovation in the industry.

Conclusion:

Paulus Jacobus Maria Van Adrichem's passion for innovation and dedication to improving patterning processes have established him as a key figure in the industry. His inventive patents and collaborative efforts highlight his invaluable contributions to the field, paving the way for a more efficient and effective future in patterning technologies.

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