The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Dec. 17, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Paulus Jacobus Maria Van Adrichem, Wijchen, NL;
Ahmad Wasiem Ibrahim El-Said, San Jose, CA (US);
Christoph Rene Konrad Cebulla Hennerkes, Felton, CA (US);
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70441 (2013.01); G03F 7/706 (2013.01); G03F 7/70433 (2013.01);
Abstract
A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.