The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Aug. 30, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Steven George Hansen, Phoenix, AZ (US);
Kateryna Stanislavovna Lyakhova, Veldhoven, NL;
Paulus Jacobus Maria Van Adrichem, Wijchen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/33 (2020.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01); G06F 17/10 (2006.01); G06F 30/398 (2020.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G03F 7/70125 (2013.01); G03F 7/70866 (2013.01); G06F 17/10 (2013.01); G06F 30/398 (2020.01); G03F 7/70441 (2013.01);
Abstract
A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.