Eindhoven, Netherlands

Paul Peter Anna Antonius Brom

USPTO Granted Patents = 6 

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2009-2022

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6 patents (USPTO):Explore Patents

Title: Paul Peter Anna Antonius Brom: A Trailblazer in the Field of Innovation

Introduction:

Paul Peter Anna Antonius Brom, based in Eindhoven, NL, is a standout figure in the world of inventors, known for his passion for innovation and relentless pursuit of excellence. With a total of 6 patents to his name, Brom's contributions continue to inspire future generations to push boundaries and create a better future.

Latest Patents:

Brom's latest patents include an elastic guiding device, a positioning device, and a blade for a lithographic apparatus. The elastic guiding device supports a mass with respect to a base in a specific direction, enhancing stiffness where needed. Another invention is a debris mitigation system for a radiation source, featuring a contamination trap designed to receive and react with liquid metal fuel debris emitted from a plasma formation region.

Career Highlights:

Brom is currently associated with ASML Netherlands B.V., a leading company in the field of lithography equipment. His innovative work has significantly contributed to the advancements in lithographic apparatus technology, improving efficiency and precision in the manufacturing industry.

Collaborations:

Throughout his career, Brom has collaborated with esteemed colleagues, including Arnoud Cornelis Wassink and Vadim Yevgenyevich Banine. Together, they have worked on cutting-edge projects, driving innovation and setting new industry standards.

Conclusion:

Paul Peter Anna Antonius Brom's dedication to innovation and his groundbreaking inventions have solidified his position as a pioneer in the field of inventors. His work not only showcases his technical expertise but also his determination to make a lasting impact on the world of technology. As Brom continues to pave the way for future innovators, his legacy will undoubtedly inspire generations to come.

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