The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Dec. 13, 2006
Arnoud Cornelis Wassink, Veldhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Derk Jan Wilfred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Paul Peter Anna Antonius Brom, Eindhoven, NL;
Wouter Anthon Soer, Nijmegen, NL;
Arnoud Cornelis Wassink, Veldhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Derk Jan Wilfred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Paul Peter Anna Antonius Brom, Eindhoven, NL;
Wouter Anthon Soer, Nijmegen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.