Company Filing History:

12 out of 2,874

Hitachi-high-technologies Corporation

Years Active: 1995-2015

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17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9129775 - Specimen potential measuring method, and charged particle beam device (2015-09-08),

2. 9000366 - Method and apparatus for measuring displacement between patterns and scanning electron microscope installing unit for measuring displacement between patterns (2015-04-07),

3. 8766182 - Method for detecting information of an electric potential on a sample and charged particle beam apparatus (2014-07-01),

4. 8487250 - Method for detecting information of an electronic potential on a sample and charged particle beam apparatus (2013-07-16),

5. 8304725 - Charged particle beam system (2012-11-06),

6. 8294118 - Method for adjusting optical axis of charged particle radiation and charged particle radiation device (2012-10-23),

7. 8263934 - Method for detecting information of an electric potential on a sample and charged particle beam apparatus (2012-09-11),

8. 8200006 - Image processing apparatus for analysis of pattern matching failure (2012-06-12),

9. 8080789 - Sample dimension measuring method and scanning electron microscope (2011-12-20),

10. 8026482 - Charged particle beam apparatus and control method therefor (2011-09-27),

11. 7851754 - Charged particle beam system (2010-12-14),

12. 7714288 - Charged particle beam apparatus (2010-05-11),

13. 7659508 - Method for measuring dimensions of sample and scanning electron microscope (2010-02-09),

14. 7545977 - Image processing apparatus for analysis of pattern matching failure (2009-06-09),

15. 5668368 - Apparatus for suppressing electrification of sample in charged beam (1997-09-16),

Title: Osamu Nasu: Innovator in Specimen Measurement Technologies

Introduction

Osamu Nasu is a prominent inventor based in Hitachinaka, Japan, known for his significant contributions to the field of specimen measurement technologies. With a total of 17 patents to his name, Nasu has made remarkable advancements that enhance the precision and efficiency of measuring specimen potentials and displacements.

Latest Patents

Among his latest patents are the "Specimen Potential Measuring Method" and the "Charged Particle Beam Device." The specimen potential measuring method aims to perform charge measurement or focusing at high speed and with high precision, even for specimens with mixed fixed and induced charges. This innovative approach utilizes a first measuring device located outside the specimen chamber and a second device within the chamber to selectively conduct measurements based on predetermined threshold values. Additionally, his method for measuring displacement between patterns involves recording the correspondence between parameters of lenses and beam deflectors in an electron optical system, allowing for accurate displacement calculations.

Career Highlights

Nasu has had a distinguished career, working with notable companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Nasu has collaborated with esteemed colleagues, including Katsuhiko Sakai and Yoichi Ose. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Osamu Nasu's work in specimen measurement technologies has significantly impacted the field, showcasing his dedication to innovation and precision. His patents reflect a commitment to advancing measurement techniques, making him a notable figure in the realm of inventions.

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