The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Apr. 03, 2013
Hitachi High-technologies Corporation, Tokyo, JP;
Atsuko Yamaguchi, Kodaira, JP;
Yasunari Sohda, Kawasaki, JP;
Tatsuya Maeda, Hitachinaka, JP;
Osamu Nasu, Hitachinaka, JP;
Hiroki Kawada, Tsuchiura, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In order that a displacement between patterns of different heights, formed on a sample in a plurality of different pattern-forming steps, can be measured at fixed throughput and with high accuracy, correspondence between parameters of lenses and beam deflector of an electron optical system and an angle of incidence of a beam upon the sample is recorded as data, then a correction value for the amount of displacement or edge positions is calculated, and a true amount of displacement is calculated from the correction value and an image under observation.