Olga Kryliouk

This inventor holds 28 USPTO granted patents and 21 published patent applications and 3 EPO patents. Top assignees: Applied Materials, Inc., University of Florida Research Foundation Inc., Glo Ab. Active years: 2001-2026.

USPTO Granted Patents = 28 (Patent Applications = 21)

% Patents Active = 71.4

EPO Patents = 3 (Patent Applications = 8)

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 268(Granted Patents)

Location History:

Gainesville, FL (US) (2001 - 2015)
Sunnyvale, CA (US) (2011 - 2018)

Company Filing History:

14 out of 14,391

Applied Materials, Inc.

patents

7 out of 3,041

University of Florida Research Foundation Inc.

5. 1 out of 834,307

Other

patents

Years Active: 2001-2026

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28 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12588316 - Optoelectronic device comprising three-dimensional semiconductor elements and method for manufacturing said device (2026-03-24),

2. 12550486 - Optoelectronic device with axial three-dimensional light-emitting diodes (2026-02-10),

3. 9932670 - Method of decontamination of process chamber after in-situ chamber clean (2018-04-03),

4. 9570651 - Coalesced nanowire structures with interstitial voids and method for manufacturing the same (2017-02-14),

5. 9444007 - Nanopyramid sized opto-electronic structure and method for manufacturing of same (2016-09-13),

6. 9431477 - Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) (2016-08-30),

7. 9196795 - Formation of group III-V material layers on patterned substrates (2015-11-24),

8. 9035278 - Coalesced nanowire structures with interstitial voids and method for manufacturing the same (2015-05-19),

9. 8946674 - Group III-nitrides on Si substrates using a nanostructured interlayer (2015-02-03),

10. 8921141 - Nanopyramid sized opto-electronic structure and method for manufacturing of same (2014-12-30),

11. 8765501 - Formation of group III-V material layers on patterned substrates (2014-07-01),

12. 8716049 - Growth of group III-V material layers by spatially confined epitaxy (2014-05-06),

13. 8568529 - HVPE chamber hardware (2013-10-29),

14. 8507304 - Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) (2013-08-13),

15. 8491720 - HVPE precursor source hardware (2013-07-23),

Title: The Innovative Journey of Olga Kryliouk

Introduction: Olga Kryliouk, a talented inventor based in Sunnyvale, CA, has been making significant contributions to the world of technology and innovation.

Latest Patents: Olga Kryliouk holds several patents in the field of artificial intelligence and machine learning, with her latest inventions focusing on advanced algorithms for data analysis and predictive modeling.

Career Highlights: With a background in computer science and engineering, Olga Kryliouk has worked for top tech companies in Silicon Valley, where she honed her skills in developing cutting-edge solutions for complex problems.

Collaborations: Throughout her career, Olga Kryliouk has collaborated with leading researchers and scientists from renowned universities and research institutions, fostering a culture of innovation and knowledge sharing.

Conclusion: Olga Kryliouk's passion for pushing the boundaries of technology and her dedication to creating innovative solutions continue to inspire the next generation of inventors and entrepreneurs.