Nozomu Matsuda

Title: Nozomu Matsuda: Innovator in Semiconductor Technology

Introduction

Nozomu Matsuda is a prominent inventor based in Akishima, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on enhancing the performance and integration of semiconductor integrated circuitry.

Latest Patents

One of Matsuda's latest patents is a technology for semiconductor integrated circuitry that allows each of the DRAM memory cells to be finely divided. This innovation leads to higher integration and faster operation of the circuitry. The method for manufacturing such a semiconductor integrated circuit involves forming gate electrodes via a gate insulating film on the main surface of a semiconductor substrate. Additionally, first and second side wall spacers composed of silicon nitride and silicon oxide, respectively, are formed on the side surfaces of each gate electrode. The process includes opening connecting holes in the selecting MISFETs in the DRAM memory cell area, which are formed in a self-matching manner with respect to the first side wall spacers. Furthermore, high-density N-type and P-type semiconductor areas are created in a self-matching manner with respect to the second side wall spacers.

Career Highlights

Matsuda has worked with notable companies, including Hitachi, Ltd. His experience in the semiconductor industry has allowed him to develop cutting-edge technologies that have a lasting impact on the field.

Collaborations

Some of his coworkers include Kozo Watanabe and Atsushi Ogishima, who have collaborated with him on various projects in semiconductor technology.

Conclusion

Nozomu Matsuda's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of faster and more efficient semiconductor integrated circuits.