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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Norman Chen

USPTO Granted Patents = 14

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 249(Granted Patents)


Location History:

  • Poughkeepsie, NY (US) (2010 - 2016)
  • Malta, NY (US) (2019)

Company Filing History:

goldMedal14 out of 5,671 
 
Globalfoundries Inc.
 patents

Years Active: 2010-2019

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14 patents (USPTO):Explore Patents
1. 10401837 - Generating risk inventory and common process window for adjustment of manufacturing tool (2019-09-03),
2. 10386715 - Methodology for post-integration awareness in optical proximity correction (2019-08-20),
3. 9484300 - Device resulting from printing minimum width semiconductor features at non-minimum pitch (2016-11-01),
4. 9443055 - Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts (2016-09-13),
5. 9263349 - Printing minimum width semiconductor features at non-minimum pitch and resulting device (2016-02-16),
6. 9171735 - Method for fabricating a semiconductor integrated circuit with a litho-etch, litho-etch process for etching trenches (2015-10-27),
7. 9064086 - Retargeting semiconductor device shapes for multiple patterning processes (2015-06-23),
8. 9026977 - Power rail layout for dense standard cell library (2015-05-05),
9. 8993224 - Multiple patterning process for forming trenches or holes using stitched assist features (2015-03-31),
10. 8910094 - Retargeting semiconductor device shapes for multiple patterning processes (2014-12-09),
11. 8782571 - Multiple patterning process for forming trenches or holes using stitched assist features (2014-07-15),
12. 8612904 - Use of polarization and composite illumination source for advanced optical lithography (2013-12-17),
13. 8010915 - Grid-based fragmentation for optical proximity correction in photolithography mask applications (2011-08-30),
14. 7776494 - Lithographic mask and methods for fabricating a semiconductor device (2010-08-17),

Title: The Innovative Contributions of Norman Chen

Introduction

Norman Chen is a prominent inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of manufacturing technology, holding a total of 14 patents. His work focuses on enhancing manufacturing processes and improving the reliability of circuit production.

Latest Patents

Among his latest patents is a method for generating a risk inventory and common process window for the adjustment of manufacturing tools. This method involves converting an image of a manufactured circuit into a plurality of representative contours, which correspond to printed features in the circuit. It generates a risk inventory to identify process-sensitive geometries and a common process window that indicates the manufacturing reliability of each feature. Additionally, he has developed a methodology for post-integration awareness in optical proximity correction. This method creates an optical proximity correction model and assesses it through optical rule checking, utilizing high-density critical dimension scanning electron microscopy.

Career Highlights

Norman Chen is currently employed at GlobalFoundries Inc., where he applies his expertise in manufacturing technology. His innovative approaches have contributed to advancements in the semiconductor industry, particularly in the areas of circuit manufacturing and optical proximity correction.

Collaborations

Throughout his career, Norman has collaborated with talented individuals such as Yuyang Sun and Chidam Kallingal. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Norman Chen's contributions to manufacturing technology and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work continues to influence the industry and drive advancements in circuit production.

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