Company Filing History:

17 out of 42,485

Hitachi, Ltd.

patents

1 out of 1,037

Agency of Industrial Science and Technology

patents

Years Active: 1977-1996

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18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5506472 - Variable-frequency type radio-frequency quadrupole accelerator including (1996-04-09),

2. 5349196 - Ion implanting apparatus (1994-09-20),

3. 5266146 - Microwave-powered plasma-generating apparatus and method (1993-11-30),

4. 5086256 - External resonance circuit type radio frequency quadrupole accelerator (1992-02-04),

5. 5053678 - Microwave ion source (1991-10-01),

6. 4924101 - Charged particle source (1990-05-08),

7. 4801847 - Charged particle accelerator using quadrupole electrodes (1989-01-31),

8. 4658143 - Ion source (1987-04-14),

9. 4633138 - Ion implanter (1986-12-30),

10. 4629930 - Plasma ion source (1986-12-16),

11. 4577396 - Method of forming electrical contact to a semiconductor substrate via a (1986-03-25),

12. 4543465 - Microwave plasma source having improved switching operation from plasma (1985-09-24),

13. 4433228 - Microwave plasma source (1984-02-21),

14. 4409520 - Microwave discharge ion source (1983-10-11),

15. 4393333 - Microwave plasma ion source (1983-07-12),

Title: Noriyuki Sakudo: Innovator in Ion Acceleration Technology

Introduction

Noriyuki Sakudo is a prominent inventor based in Ohme, Japan, known for his significant contributions to the field of ion acceleration technology. With a total of 18 patents to his name, Sakudo has made remarkable advancements that enhance the efficiency and effectiveness of ion implantation processes.

Latest Patents

Sakudo's latest patents include a variable-frequency type radio-frequency quadrupole accelerator. This innovative design features a secondary coil that forms a resonant circuit in cooperation with a quadrupole. The secondary coil is constructed from conductive tubes and is cooled by feeding coolant, such as pure water, into the tubes. This design minimizes thermal deformation of the secondary coil when the accelerator is driven with a large amount of power. Consequently, the variation of the resonant frequency of the resonant circuit, resulting from the deformation of the secondary coil, can be minimized, ensuring a stable ion acceleration ability. Additionally, his ion implanting apparatus incorporates a magnetic quadrupole lens that performs mass spectrometry of an ion beam while converging it. This technology reduces the divergence of the ion beam, allowing for the generation of a high-energy ion beam with a large current.

Career Highlights

Throughout his career, Sakudo has worked with notable organizations, including Hitachi, Ltd. and the Agency of Industrial Science and Technology. His work in these institutions has significantly influenced the development of advanced ion acceleration technologies.

Collaborations

Sakudo has collaborated with esteemed colleagues, including Katsumi Tokiguchi and Hidemi Koike, contributing to various projects that have furthered the field of ion implantation.

Conclusion

Noriyuki Sakudo's innovative work in ion acceleration technology has established him as a key figure in the field. His patents and collaborations reflect his commitment to advancing technology and improving ion implantation processes.

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