The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1983
Filed:
Dec. 10, 1980
Applicant:
Inventors:
Noriyuki Sakudo, Ohme, JP;
Katsumi Tokiguchi, Hachioji, JP;
Hidemi Koike, Tokorozawa, JP;
Ichiro Kanomata, Fuchu, JP;
Humihiko Nakashima, Katsuta, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H05B / ;
U.S. Cl.
CPC ...
31511181 ; 315 39 ; 31511141 ; 3133631 ; 313364 ; 2503 / ; 2504 / ;
Abstract
A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.