Katsuta, Japan

Humihiko Nakashima

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1983.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Humihiko Nakashima. Retrieved from https://idiyas.com/inventor/humihiko-nakashima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1983

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1 patent (USPTO):Explore Patents

Title: Humihiko Nakashima: Innovator in Microwave Plasma Technology

Introduction

Humihiko Nakashima is a notable inventor based in Katsuta, Japan. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and patents. His work has implications for various applications, including ion sources used in advanced technologies.

Latest Patents

Nakashima holds a patent for a microwave plasma ion source. This invention is designed to apply a microwave electric field and a magnetic field to a discharge gas introduced into a discharge region. The process forms plasma from which ions are extracted. The magnetic field is generated by an electromagnet positioned on the low-voltage side of ion extraction electrodes, along with a high-permeability member that allows microwaves to propagate freely.

Career Highlights

Nakashima is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced technologies that enhance the efficiency and effectiveness of plasma applications.

Collaborations

Throughout his career, Nakashima has collaborated with esteemed colleagues such as Noriyuki Sakudo and Katsumi Tokiguchi. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Humihiko Nakashima's contributions to microwave plasma technology exemplify the innovative spirit of modern inventors. His patent for a microwave plasma ion source showcases his expertise and commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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