The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 1985

Filed:

Jul. 26, 1983
Applicant:
Inventors:

Noriyuki Sakudo, Ohme, JP;

Katsunobu Abe, Katsuta, JP;

Katsumi Tokiguchi, Machida, JP;

Hidemi Koike, Tokorozawa, JP;

Osami Okada, Chofu, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; H01J / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2041 / ; 2041 / ; 156345 ; 31511141 ; 313156 ;
Abstract

In a microwave plasma source, a discharge space supplied with a microwave electric field is supplied with a DC magnetic field. A material to be ionized is introduced into the discharge space to produce plasma, whereby ions are extracted through an ion extracting system. A switch is provided for effecting through switching operation the change-over of the magnetic field applied to the discharge space from the intensity for the ignition of plasma to the intensity for ion extraction in succession to completion of the plasma ignition.


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