Katsuta, Japan

Katsunobu Abe


Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 77(Granted Patents)


Location History:

  • Ibaraki, JP (1982)
  • Katsuta, JP (1985 - 1989)

Company Filing History:


Years Active: 1982-1989

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3 patents (USPTO):Explore Patents

Title: **Innovator Katsunobu Abe: Pioneering Advances in Semiconductor Technology**

Introduction

Katsunobu Abe, a notable inventor based in Katsuta, Japan, has made significant contributions to the field of semiconductor manufacturing. With a total of three patents to his name, he continues to drive innovations that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Katsunobu Abe's latest innovations include a groundbreaking **Ion Implantation Apparatus for Semiconductor Manufacture**. This apparatus is specially designed for the implantation of double charged ions into semiconductor wafers. By utilizing a mass-separating electromagnet, it selectively allows ions of a predetermined mass to be implanted into the wafers via a slit mechanism. This sophisticated design incorporates field electrodes to separate ions of different energy levels and employs deflection magnets to ensure proper alignment of the ion beam with the wafer. Additionally, correction means are implemented to guarantee that the ion beam strikes the wafer at the optimal angle.

Another notable invention by Abe is a **Microwave Plasma Source with Improved Switching Operations**. This device enhances the process of plasma generation by introducing a DC magnetic field into a discharge space supplied with microwave energy. A unique switch enables the transition between the ignition and ion extraction phases, allowing for more controlled and efficient plasma use in semiconductor fabrications.

Career Highlights

Katsunobu Abe has established his career at Hitachi, Ltd., where he has developed innovative solutions that have contributed to the advancement of semiconductor technology. His expertise and ingenuity play a crucial role in the formulation of cutting-edge manufacturing processes.

Collaborations

Throughout his tenure, Abe has worked alongside distinguished colleagues, including Noriyuki Sakudo and Katsumi Tokiguchi. These collaborations fostered a collective effort to push the boundaries of semiconductor technology, resulting in impactful innovations.

Conclusion

Katsunobu Abe stands as a prominent figure in the field of semiconductor manufacturing, with his inventive spirit reflected in his patented technologies. His commitment to excellence and collaboration with talented professionals continues to shape the future of semiconductor devices and manufacturing processes.

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