Kumamoto-ken, Japan

Noriyuki Anai


Average Co-Inventor Count = 4.1

ph-index = 17

Forward Citations = 703(Granted Patents)


Location History:

  • Goushimachi, JP (1999)
  • Koshimachi, JP (2000)
  • Kumamoto, JP (1991 - 2001)
  • Kumamoto-ken, JP (1997 - 2004)

Company Filing History:


Years Active: 1991-2004

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27 patents (USPTO):Explore Patents

Title: Noriyuki Anai: Innovator in Semiconductor Coating Technologies

Introduction

Noriyuki Anai is a distinguished inventor based in Kumamoto-ken, Japan, known for his significant contributions to semiconductor processing technologies. With an impressive portfolio of 27 patents, Anai specializes in the development of innovative coating methods and apparatuses that enhance the efficiency and precision of semiconductor manufacturing.

Latest Patents

Anai’s latest patents include a groundbreaking coating method and apparatus designed for semiconductor processes. One notable invention features a coating apparatus equipped with a spin chuck that utilizes vacuum suction to hold semiconductor wafers horizontally. A novel movable beam with integrated first and second nozzles facilitates the application of a photo-resist liquid and a solvent sequentially. This innovative approach increases the wettability of the wafer before the application of the photo-resist liquid, enhancing the coating process's effectiveness. Another key patent involves a substrate held on a spin chuck, where the resist solution is applied at multiple positions using a series of nozzles. This apparatus allows for precise mechanical adjustments and versatility in handling various treatment agents, ensuring a uniform coating film with optimal thickness.

Career Highlights

Throughout his career, Noriyuki Anai has made notable contributions while working with prominent companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these institutions has played a crucial role in driving innovation within the semiconductor industry. Anai's dedication to research and development has resulted in significant advancements in coating technologies.

Collaborations

In his journey as an inventor, Anai has collaborated with esteemed colleagues, including Takami Satoh and Tsutae Omori. These partnerships have fostered a collaborative environment that encourages the sharing of ideas and expertise, further propelling innovations in semiconductor manufacturing techniques.

Conclusion

Noriyuki Anai stands out as a remarkable inventor whose work continues to influence the semiconductor industry. His 27 patents reflect a commitment to innovation and excellence in coating technologies, promising a brighter future for semiconductor processing advancements. Anai's contributions underscore the importance of research and collaboration in driving technological progress.

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