The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Jul. 29, 1999
Applicant:
Inventors:
Hideyuki Takamori, Kumamoto-ken, JP;
Kiyohisa Tateyama, Kumamoto-ken, JP;
Kengo Mizosaki, Kumamoto-ken, JP;
Noriyuki Anai, Kumamoto-ken, JP;
Mitsuhiro Sakai, Kumamoto-ken, JP;
Shinobu Tanaka, Kumamoto-ken, JP;
Yoichi Honda, Kumamoto-ken, JP;
Yuji Shimomura, Kumamoto-ken, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 ;
U.S. Cl.
CPC ...
G03D 5/00 ;
Abstract
Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.