Noritaka Ishihara

This inventor holds 46 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Semiconductor Technology. Top assignee: Semiconductor Energy Laboratory Co., Ltd.. Active years: 2014-2025.

USPTO Granted Patents = 46 (Patent Applications = 5)

% Patents Active = 82.6

EPO Patents = 1

Average Co-Inventor Count = 5.9

ph-index = 9

Forward Citations = 359(Granted Patents)

Location History:

Kawasaki, JP (2014 - 2017)
Koza, JP (2016 - 2024)
Kanagawa, JP (2016 - 2024)

Company Filing History:

46 out of 16,652

Semiconductor Energy Laboratory Co., Ltd.

patents

Years Active: 2014-2025

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Areas of Expertise:

Semiconductor Device

Metal Oxide Film

Transistor

Sputtering Target

Oxide Film

Insulator

Multilayer Film

Display Device

Electronic Appliance

Hydrogen Concentration

Stacked Film

Measurement Device

46 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12349460 - Manufacturing method of semiconductor device (2025-07-01),

2. 12302639 - Metal oxide film and method for forming metal oxide film (2025-05-13),

3. 12154827 - Semiconductor device having plurality of insulators (2024-11-26),

4. 11978742 - Metal oxide film and method for forming metal oxide film (2024-05-07),

5. 11967505 - Method for manufacturing sputtering target, method for forming oxide film, and transistor (2024-04-23),

6. 11804407 - Semiconductor device having plurality of insulators (2023-10-31),

7. 11742431 - Semiconductor device and method for manufacturing semiconductor device (2023-08-29),

8. 11652110 - Metal oxide film and method for forming metal oxide film (2023-05-16),

9. 11637015 - Method for manufacturing sputtering target, method for forming oxide film, and transistor (2023-04-25),

10. 11239237 - Semiconductor device (2022-02-01),

11. 11211467 - Semiconductor device and method for manufacturing semiconductor device (2021-12-28),

12. 11195758 - Semiconductor device and method for manufacturing semiconductor device having plurality of insulator (2021-12-07),

13. 11152513 - Semiconductor device and method for manufacturing semiconductor device (2021-10-19),

14. 11139166 - Method for manufacturing sputtering target, method for forming oxide film, and transistor (2021-10-05),

15. 10892282 - Metal oxide film and method for forming metal oxide film (2021-01-12),

Title: Noritaka Ishihara: Pioneering Inventor from Kanagawa

Introduction: Noritaka Ishihara is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ishihara holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Ishihara has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Ishihara has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Noritaka Ishihara's dedication to pushing the boundaries of technology and his passion for creating solutions to complex problems make him a true visionary in the world of inventions.