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For the Inventor, By the Inventor

Toyama, Japan

Norikazu Mizuno

This inventor holds 33 USPTO granted patents and 11 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Hitachi-Kokusai Electric Inc., Kokusai Electric Corporation, Kokusai Electric Co., Ltd.. Active years: 2002-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norikazu Mizuno. Retrieved from https://idiyas.com/inventor/norikazu-mizuno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 97.0

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 137(Granted Patents)


Location History:

  • Tokyo, JP (2002 - 2004)
  • Nakano-ku, JP (2004 - 2008)
  • Toyama, JP (2010 - 2023)

Company Filing History:

goldMedal24 out of 1,258 
 
Hitachi-Kokusai Electric Inc.
 patents
silverMedal6 out of 697 
 
Kokusai Electric Corporation
 patents
bronzeMedal3 out of 153 
 
Kokusai Electric Co., Ltd.
 patents
4. 3 out of 1,527 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
where one patent can have more than one assignee

Years Active: 2002-2026

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Areas of Expertise:
Semiconductor Device
Substrate Processing
Manufacturing Method
Device Fabrication
Non-Transitory Medium
Recording Medium
Production Method
Apparatus Manufacturing
33 patents (USPTO):Explore Patents
1. 12757652 - Method of processing substrate, recording medium, substrate processing apparatus and method of manufacturing semiconductor device (2026-10-06),
2. 12170206 - Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus (2024-12-17),
3. 12148614 - Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium (2024-11-19),
4. 12142476 - Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2024-11-12),
5. 11705325 - Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2023-07-18),
6. 11527401 - Method of processing substate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2022-12-13),
7. 9548198 - Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2017-01-17),
8. 9396929 - Method of manufacturing a semiconductor device, substrate processing apparatus and recording medium (2016-07-19),
9. 9343290 - Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2016-05-17),
10. 9334567 - Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus (2016-05-10),
11. 9263251 - Method of manufacturing semiconductor device, semiconductor device and substrate processing apparatus (2016-02-16),
12. 9217199 - Substrate processing apparatus (2015-12-22),
13. 9123531 - Method of manufacturing semiconductor device, semiconductor device and substrate processing apparatus (2015-09-01),
14. 9018104 - Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus (2015-04-28),
15. 8847343 - Method of manufacturing semiconductor device, semiconductor device and substrate processing apparatus (2014-09-30),

Sure, here is an article about inventor Norikazu Mizuno:

Title: Innovator Profile: Norikazu Mizuno - A Trailblazer in Semiconductor Device Manufacturing

Introduction:

Norikazu Mizuno, a talented innovator hailing from Toyama, Japan, has made significant contributions to the field of semiconductor device manufacturing. With an impressive portfolio of 29 patents, Mizuno's groundbreaking work has revolutionized the industry.

Latest Patents:

Mizuno's latest patents showcase his expertise in substrate processing and semiconductor device manufacturing. One of his notable inventions includes a method of processing a substrate, which involves the precise formation of a film on the substrate by performing a series of cycles. This method includes the non-simultaneous supply of precursor gas, inert gas, and reaction gas to the substrate, ensuring optimal processing conditions.

Career Highlights:

Throughout his career, Mizuno has worked with esteemed companies such as Hitachi-Kokusai Electric Inc. and Kokusai Electric Co., Ltd. His tenure with these organizations has provided him with invaluable experience and insight into the semiconductor industry, shaping him into the innovator he is today.

Collaborations:

Mizuno has collaborated with notable colleagues such as Masayuki Asai and Kazuyuki Okuda. Together, they have pushed the boundaries of semiconductor device manufacturing, fostering a culture of innovation and excellence within their teams.

Conclusion:

In conclusion, Norikazu Mizuno stands out as a pioneering inventor in the realm of semiconductor device manufacturing. His dedication to pushing the boundaries of technology and his knack for developing cutting-edge solutions have earned him a well-deserved reputation in the industry. Mizuno's continued innovation is sure to shape the future of semiconductor manufacturing for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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