logo

For the Inventor, By the Inventor

Tokyo, Japan

Nobuyuki Irie

USPTO Granted Patents = 11

Average Co-Inventor Count = 1.4

ph-index = 9

Forward Citations = 360(Granted Patents)


Location History:

  • Kawasaki, JP (1996 - 2004)
  • Tokyo, JP (2003 - 2005)
  • Kumagaya, JP (2006)

Company Filing History:

goldMedal10 out of 8,898 
 
Nikon Corporation
 patents
silverMedal1 out of 7 
 
Nikon Corooration
 patents

Years Active: 1996-2006

Loading Chart...
11 patents (USPTO):Explore Patents
1. 7034922 - Exposure apparatus and exposure method (2006-04-25),
2. 7001674 - Exposure method, exposure apparatus, and method of production of device (2006-02-21),
3. 6842225 - Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device (2005-01-11),
4. 6710847 - Exposure method and exposure apparatus (2004-03-23),
5. 6607863 - Exposure method of production of density filter (2003-08-19),
6. 6606145 - Exposure apparatus, microdevice, photomask, and exposure method (2003-08-12),
7. 6337162 - Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice (2002-01-08),
8. 6118516 - Projection exposure apparatus having a filter arranged in its projection (2000-09-12),
9. 5808910 - Alignment method (1998-09-15),
10. 5596204 - Method for aligning processing areas on a substrate with a predetermined (1997-01-21),
11. 5525808 - Alignment method and alignment apparatus with a statistic calculation (1996-06-11),

Title: Nobuyuki Irie: Innovator in Semiconductor Technology

Introduction

Nobuyuki Irie is a prominent inventor based in Tokyo, Japan, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, Irie's work has greatly influenced the field of exposure apparatus and methods used in semiconductor manufacturing.

Latest Patents

Irie's latest patents include an innovative exposure apparatus and exposure method that allows for the formation of fine patterns with high accuracy. This is achieved by correcting changes in the image of a light-attenuating part of a density filter on a substrate, which arise due to variations in illumination conditions on a reticle. By adjusting the amount of defocus of the density filter concerning the reticle conjugate plane, Irie has enhanced the precision of semiconductor fabrication. Another notable patent focuses on an exposure method designed to prevent the accumulation of process errors for substrates processed by an apparatus intended for multiprocessing. This method ensures high-quality production of semiconductor chips by efficiently managing wafer processing information across multiple systems.

Career Highlights

Throughout his career, Nobuyuki Irie has worked with renowned companies, including Nikon Corporation. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that have improved manufacturing processes and product quality.

Collaborations

Irie has collaborated with notable professionals in the field, including Shigeru Hirukawa and Eiji Takane. These collaborations have further enriched his work and have led to innovative solutions in semiconductor technology.

Conclusion

Nobuyuki Irie's contributions to semiconductor technology through his patents and collaborations have made a lasting impact on the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…