The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Apr. 11, 2000
Nobuyuki Irie, Tokyo, JP;
Nobuyuki Irie, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate () while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor () on the substrate stage (), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).