The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2002
Filed:
Sep. 13, 2000
Applicant:
Inventor:
Nobuyuki Irie, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
Abstract
A method of exposure projecting and exposing a pattern formed on a mask on to a photosensitive substrate through a projection optical system, comprising the steps of measuring a position of an image projected by said projection optical system; and projecting and exposing said pattern of the mask in a state with imaging characteristics corrected to reduce an amount of offset of a position of said projected image from an ideal position.