The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 1998

Filed:

Aug. 29, 1996
Applicant:
Inventors:

Nobuyuki Irie, Kawasaki, JP;

Shigeru Hirukawa, Kashiwa, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
364559 ; 2504911 ; 356399 ; 356400 ; 356401 ;
Abstract

A substrate has a plurality of areas, from which several specific areas are selected. The coordinate positions of the specific areas on a static coordinate system are measured and the coordinate positions of the specific areas on the static coordinate system are calculated by the statistic calculation. For the respective specific areas, the calculated coordinate positions are subtracted from the measured coordinate positions to obtain the respective nonlinear position errors of the specific areas. When there is a peculiar area where the nonlinear position error exceeds an allowed value, the coordinate position of at least one area around the peculiar area is measured to obtain the nonlinear position error thereof. Prior to calculating the coordinate positions of the areas on the substrate on the static coordinate system by the use of the coordinate positions of the specific areas, it is judged based on the nonlinear position errors of the peculiar area and the area around the peculiar area whether the coordinate position of the peculiar area is used.


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