The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
May. 07, 2003
Nobuyuki Irie, Kumagaya, JP;
Nobuyuki Irie, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure method for preventing accumulation of process error for substrates processed by an apparatus designed for multiprocessing and producing high quality semiconductor chips. A semiconductor integrated circuit production line polishes wafers of individual lots at a first processing system and second processing system of a CMP system two at a time. Wafer processing information indicating at which processing system of the first processing system and second processing system each wafer has been processed is transmitted through a communication line to a later processing apparatus including an exposure apparatus. The wafers of a lot loaded in the exposure apparatus are allocated to a plurality of processing systems of the exposure apparatus so that wafers processed by the same processing system are processed by the same processing system among the two processing systems of the exposure apparatus and are exposed at those processing systems.