The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Apr. 27, 2001
Nobuyuki Irie, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A pattern enlarged from a transfer pattern is divided into patterns (Pi) of a plurality of master reticles (Ri). Images of the patterns (Pi) of the plurality of master reticles (Ri) reduced by a projection optical system are successively-projected and exposed on the surface of a blank (mask substrate) while stitching. Marks (M , M ) indicating identification information for identifying a master reticle from another master reticle, transfer positions, etc. are formed on the master reticles (Ri). These marks (M , M ) are detected before the exposure and exposure is performed in accordance with the information on the transfer position etc. shown by the marks (M , M ) or reticle information (exposure conditions, various correction values, etc.) relating to the master reticles stored and held in advance corresponding to the identification information. The number of work steps when producing a working reticle using the plurality of master reticles is reduced and occurrence of work errors can be prevented.