Location History:
- Himeji, JP (2001 - 2017)
- Hyogo, JP (2010 - 2018)
- Akashi, JP (2020)
- Osaka, JP (2017 - 2021)
Company Filing History:
20 out of 301 
7 out of 35 
3 out of 1,715 
Years Active: 2001-2021
Title: Nobutaka Fujimoto: Innovator in Etching Mask Technology
Introduction
Nobutaka Fujimoto, based in Osaka, Japan, is an accomplished inventor with an impressive portfolio of 21 patents. His work primarily focuses on the development of innovative methods for producing etching masks and oxide layers, which are crucial in various semiconductor and display technologies.
Latest Patents
Fujimoto's latest patents include groundbreaking techniques such as a method of producing etching masks and an oxide layer, as well as a method for manufacturing thin film transistors. Specifically, his etching mask, used for screen printing, incorporates aliphatic polycarbonate. The multifaceted method he describes consists of an etching-mask forming step, a contact step for interacting with the oxide layer, and a heating step that promotes the decomposition of the etching mask under high temperatures. Moreover, his innovative thermally decomposable binder can be utilized in several applications, including optical materials, medicinal products, and biodegradable resins.
Career Highlights
Fujimoto has held key positions in prominent companies throughout his career, including Sumitomo Seika Chemicals Co., Ltd. and the Japan Advanced Institute of Science and Technology. His expertise and leadership in these organizations have significantly contributed to advancing etching mask technologies and related applications in the industry.
Collaborations
Throughout his career, Nobutaka Fujimoto has collaborated with esteemed colleagues such as Kiyoshi Nishioka and Satoshi Inoue. These collaborations have fostered a vibrant exchange of ideas and innovations, enhancing the development of cutting-edge technologies in their field.
Conclusion
Nobutaka Fujimoto exemplifies the spirit of innovation, demonstrating a robust commitment to advancing technology through his inventions. His contributions, especially regarding etching masks and related manufacturing methods, continue to pave the way for future advancements in the semiconductor and display industries.