Nobutaka Fujimoto

This inventor holds 21 USPTO granted patents and 4 published patent applications, plus 4 CIPO patents and 10 EPO patents. Top assignees: Sumitomo Seika Chemicals Co., Ltd., Japan Advanced Institute of Science and Technology, National Institute of Advanced Industrial Science and Technology. Active years: 2001-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobutaka Fujimoto. Retrieved from https://idiyas.com/inventor/nobutaka-fujimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 (Patent Applications = 4)

% Patents Active = 52.4

CIPO Patents = 4

EPO Patents = 10 (Patent Applications = 10)

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 42(Granted Patents)

Location History:

Himeji, JP (2001 - 2017)
Hyogo, JP (2010 - 2018)
Akashi, JP (2020)
Osaka, JP (2017 - 2021)

Company Filing History:

20 out of 302

Sumitomo Seika Chemicals Co., Ltd.

patents

7 out of 36

Japan Advanced Institute of Science and Technology

patents

3 out of 1,763

National Institute of Advanced Industrial Science and Technology

Osaka Municipal Technical Research Institute

patents

6. 1 out of 134

Tokyo University of Agriculture and Technology

patents

7. 1 out of 196

University of Tsukuba

patents

8. 1 out of 834,453

Other

patents

where one patent can have more than one assignee

Years Active: 2001-2021

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21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11133191 - Method of producing etching mask, etching mask precursor, and oxide layer, and method of manufacturing thin film transistor (2021-09-28),

2. 10759901 - Thermally decomposable binder (2020-09-01),

3. 10749034 - Semiconductor device, method for producing same and aliphatic polycarbonate (2020-08-18),

4. 10400336 - Oxide precursor, oxide layer, semiconductor element, and electronic device, and method of producing oxide layer and method of producing semiconductor element (2019-09-03),

5. 10340388 - Intermediate semiconductor device having an aliphatic polycarbonate layer (2019-07-02),

6. 10164259 - Binder for use in positive electrode for lithium ion secondary battery, positive electrode for lithium ion secondary battery containing said binder, lithium ion secondary battery using said positive electrode, and electrical machinery and apparatus (2018-12-25),

7. 10164244 - Negative-electrode mixture for non-aqueous electrolyte secondary cell, negative electrode for non-aqueous electrolyte secondary cell containing said mixture, non-aqueous electrolyte secondary cell provided with said negative electrode, and electrical device (2018-12-25),

8. 10068717 - Binder for electric double-layer capacitor electrode, electric double-layer capacitor electrode comprising same binder, electric double-layer capacitor using same electrode, and electric apparatus (2018-09-04),

9. 9985137 - Semiconductor device having a decomposed aliphatic polycarbonate layer (2018-05-29),

10. 9842916 - Oxide semiconductor layer and production method therefor, oxide semiconductor precursor, oxide semiconductor layer, semiconductor element, and electronic device (2017-12-12),

11. 9783665 - Polyolefin-based resin composition (2017-10-10),

12. 9552985 - Oxide semiconductor layer and production method therefor, oxide semiconductor precursor, oxide semiconductor layer, semiconductor element, and electronic device (2017-01-24),

13. 9414487 - Metal paste composition (2016-08-09),

14. 9356292 - Radical composition and battery using same (2016-05-31),

15. 8816040 - Polymer dye (2014-08-26),

Title: Nobutaka Fujimoto: Innovator in Etching Mask Technology

Introduction

Nobutaka Fujimoto, based in Osaka, Japan, is an accomplished inventor with an impressive portfolio of 21 patents. His work primarily focuses on the development of innovative methods for producing etching masks and oxide layers, which are crucial in various semiconductor and display technologies.

Latest Patents

Fujimoto's latest patents include groundbreaking techniques such as a method of producing etching masks and an oxide layer, as well as a method for manufacturing thin film transistors. Specifically, his etching mask, used for screen printing, incorporates aliphatic polycarbonate. The multifaceted method he describes consists of an etching-mask forming step, a contact step for interacting with the oxide layer, and a heating step that promotes the decomposition of the etching mask under high temperatures. Moreover, his innovative thermally decomposable binder can be utilized in several applications, including optical materials, medicinal products, and biodegradable resins.

Career Highlights

Fujimoto has held key positions in prominent companies throughout his career, including Sumitomo Seika Chemicals Co., Ltd. and the Japan Advanced Institute of Science and Technology. His expertise and leadership in these organizations have significantly contributed to advancing etching mask technologies and related applications in the industry.

Collaborations

Throughout his career, Nobutaka Fujimoto has collaborated with esteemed colleagues such as Kiyoshi Nishioka and Satoshi Inoue. These collaborations have fostered a vibrant exchange of ideas and innovations, enhancing the development of cutting-edge technologies in their field.

Conclusion

Nobutaka Fujimoto exemplifies the spirit of innovation, demonstrating a robust commitment to advancing technology through his inventions. His contributions, especially regarding etching masks and related manufacturing methods, continue to pave the way for future advancements in the semiconductor and display industries.

Profile summary based on public USPTO records.