The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Apr. 25, 2018
Japan Advanced Institute of Science and Technology, Ishikawa, JP;
Sumitomo Seika Chemicals Co., Ltd., Hyogo, JP;
Satoshi Inoue, Ishikawa, JP;
Tatsuya Shimoda, Ishikawa, JP;
Nobutaka Fujimoto, Osaka, JP;
Kiyoshi Nishioka, Hyogo, JP;
Shuichi Karashima, Osaka, JP;
Japan Advanced Institute of Science and Technology, Ishikawa, JP;
Sumitomo Seika Chemicals Co., Ltd., Hyogo, JP;
Abstract
It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile