The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Sep. 27, 2019
Japan Advanced Institute of Science and Technology, Ishikawa, JP;
Sumitomo Seika Chemicals Co., Ltd., Hyogo, JP;
Satoshi Inoue, Nagano, JP;
Tatsuya Shimoda, Ishikawa, JP;
Kazuhiro Fukada, Hiroshima, JP;
Kiyoshi Nishioka, Hyogo, JP;
Nobutaka Fujimoto, Osaka, JP;
Masahiro Suzuki, Hyogo, JP;
JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, Ishikawa, JP;
SUMITOMO SEIKA CHEMICALS CO., LTD., Hyogo, JP;
Abstract
The etching maskfor screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching maskincluding aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel) which is not protected by the etching mask; and a heating step of, after the contact step, heating the oxide layer (the channel) and the etching maskto or above a temperature at which the etching maskis decomposed.