Nirasaki, Japan

Nobuhiro Wada


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Nirasaki, JP (2005 - 2016)
  • Yamanashi, JP (2013 - 2016)

Company Filing History:


Years Active: 2005-2016

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5 patents (USPTO):Explore Patents

Title: Nobuhiro Wada: A Pioneer in Substrate Processing Technologies

Introduction

Nobuhiro Wada, an inventive mind based in Nirasaki, Japan, has made significant contributions to the field of substrate processing. With a total of five patents to his name, Wada has consistently demonstrated his expertise and innovation in developing advanced technology for the semiconductor industry.

Latest Patents

Wada's latest patents include a series of substrate processing apparatuses that enhance the efficiency and effectiveness of wafer processing. The first patent describes an apparatus that includes a chamber accommodating a wafer, a susceptor on which the wafer is held, and an upper electrode. This innovative setup allows for the modification of plasma density between the upper electrode and the susceptor by altering the gap between them.

His second patent also focuses on substrate processing, presenting a cylindrical chamber equipped with a movable shower head and a susceptor. This design minimizes plasma generation in specific areas, showcasing Wada's ability to tackle industry challenges through practical engineering solutions.

Career Highlights

Wada is currently associated with Tokyo Electron Limited, a prominent company in the semiconductor manufacturing equipment sector. His work has not only contributed to the company's technological advancements but has also enhanced the broader industry standards for substrate processing techniques.

Collaborations

Throughout his career, Nobuhiro Wada has collaborated with other notable inventors, including Hiroshi Tsujimoto and Makoto Kobayashi. These partnerships have provided a collaborative environment for sharing knowledge and generating innovative ideas, further pushing the boundaries of what is achievable in substrate processing.

Conclusion

Nobuhiro Wada stands out as a key figure in the realm of innovations in substrate processing apparatuses. With a keen eye for engineering solutions and a commitment to enhancing the semiconductor industry, his patents serve as a testament to his contributions and the collaborative spirit of innovation that characterizes his work.

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