The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Mar. 23, 2011
Akihiro Yoshimura, Yamanishi, JP;
Tetsuji Sato, Yamanashi, JP;
Masato Horiguchi, Yamanashi, JP;
Nobuhiro Wada, Yamanashi, JP;
Makoto Kobayashi, Hsin-chu, TW;
Hiroshi Tsujimoto, Yamanashi, JP;
Jun Tamura, Yamanashi, JP;
Mamoru Naoi, Yamanashi, JP;
Akihiro Yoshimura, Yamanishi, JP;
Tetsuji Sato, Yamanashi, JP;
Masato Horiguchi, Yamanashi, JP;
Nobuhiro Wada, Yamanashi, JP;
Makoto Kobayashi, Hsin-chu, TW;
Hiroshi Tsujimoto, Yamanashi, JP;
Jun Tamura, Yamanashi, JP;
Mamoru Naoi, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.