Tokyo, Japan

Naruhisa Miura

USPTO Granted Patents = 45 

 

Average Co-Inventor Count = 4.2

ph-index = 8

Forward Citations = 246(Granted Patents)


Location History:

  • Hyogo, JP (2003)
  • Chiyoda-ku, JP (2012)
  • Tokyo, JP (2003 - 2021)

Company Filing History:


Years Active: 2003-2021

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45 patents (USPTO):Explore Patents

Title: Naruhisa Miura: Innovator in Silicon Carbide Semiconductor Technology

Introduction

Naruhisa Miura, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 45 patents, Miura is recognized for his innovative developments, particularly in silicon carbide (SiC) semiconductor devices. His work focuses on enhancing the performance of these devices, ensuring efficiency and reliability in various applications.

Latest Patents

Among Miura's latest innovations is a groundbreaking silicon carbide semiconductor device. This invention is designed to increase switching speeds without compromising the integrity of the gate insulating film. The design includes an n-type semiconductor substrate formed of SiC, with a p-type semiconductor layer positioned strategically on the upper surface of a p-type well layer. The configuration aims to optimize the performance by ensuring that the impurity concentration in the p-type layer exceeds that of the well layer.

Another notable patent by Miura is an insulated gate silicon carbide semiconductor device, which offers a unique design that includes a drift layer of a first conductivity type on a 4H silicon carbide substrate. This invention not only relieves the electric field stress on the gate insulating film but also suppresses increases in on-resistance. The detailed structure and method for manufacturing this device signify a new era in semiconductor advancements.

Career Highlights

Naruhisa Miura has had a distinguished career, with significant roles at renowned companies such as Mitsubishi Electric Corporation and Mitsubishi Denki Kabushiki Kaisha. His experience in these prestigious organizations has been instrumental in shaping his innovative approaches to semiconductor technologies.

Collaborations

Throughout his career, Miura has collaborated with talented individuals within the industry, including his coworkers Masayuki Imaizumi and Shuhei Nakata. These collaborations have fostered a creative environment, leading to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Naruhisa Miura's contributions to the semiconductor industry, particularly with silicon carbide devices, have established him as a key innovator in the field. With an impressive array of patents and valuable collaborations, Miura continues to influence the direction of technology, pushing the boundaries of what is possible in semiconductor design and application. His work not only enhances the efficiency of electronic devices but also paves the way for future innovations in the industry.

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