Koshi, Japan

Naoyuki Okamura


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Koshi, JP (2011 - 2015)
  • Kumamoto, JP (2015 - 2024)

Company Filing History:


Years Active: 2011-2024

Loading Chart...
8 patents (USPTO):Explore Patents

Title: Naoyuki Okamura: Innovator in Substrate Processing Technologies

Introduction

Naoyuki Okamura, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate processing. With a robust portfolio of 8 patents, his work primarily focuses on improving the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his recent innovations is a **substrate processing apparatus**. This apparatus includes a processing chamber, a substrate holder to hold the substrate, and a processing liquid supply that delivers a processing liquid to the substrate. An infrared camera is integrated to acquire images of the processing chamber, while a controller monitors the state of the processing liquid and checks for any abnormalities based on the infrared imagery.

Another noteworthy invention by Okamura is a **method of treating a microelectronic substrate using dilute TMAH**. This process involves receiving a microelectronic substrate into a process chamber, where treatment solutions are applied to etch silicon layers. The treatment aims for controlled oxygen content to achieve targeted etch selectivity and uniformity, showcasing his commitment to advancing microelectronic fabrication techniques.

Career Highlights

Naoyuki Okamura is associated with **Tokyo Electron Limited**, a prominent player in the semiconductor industry. His innovative work at the company demonstrates an ongoing effort to enhance substrate processing technologies and meet the evolving needs of the microelectronics sector.

Collaborations

In his journey of innovation, Okamura has worked alongside notable colleagues including Takao Inada and Hidetsugu Yano. Collaborations with other experts in the field have likely contributed to the depth and creativity of his inventions, reinforcing the importance of teamwork in driving technological advancements.

Conclusion

Naoyuki Okamura stands out as a key innovator in the substrate processing domain. His patents reflect a deep understanding of microelectronic challenges and a commitment to developing solutions that streamline manufacturing processes. With each new invention, he continues to influence the future of semiconductor technology and processing efficiency.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…