The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Jan. 16, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Naoyuki Okamura, Kumamoto, JP;
Hirotaka Maruyama, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B05C 11/10 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B05C 11/1002 (2013.01); G01N 21/9501 (2013.01); H01L 21/67023 (2013.01); H01L 21/67288 (2013.01);
Abstract
A substrate processing apparatus includes: a processing chamber; a substrate holder that is disposed in the processing chamber and holds a substrate; a processing liquid supply that supplies a processing liquid to the substrate held in the substrate holder; an infrared camera that acquires an infrared image of the processing chamber; and a controller that detects at least a state of the processing liquid based on the infrared image and monitors presence/absence of an abnormality.