The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8545640 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 01, 2013

Filed:

Jun. 16, 2011
Applicants:

Teruomi Minami, Koshi, JP;

Naoyuki Okamura, Koshi, JP;

Yosuke Kawabuchi, Koshi, JP;

Inventors:

Teruomi Minami, Koshi, JP;

Naoyuki Okamura, Koshi, JP;

Yosuke Kawabuchi, Koshi, JP;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.


Find Patent Forward Citations

Minami, Teruomi. (2013). Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus (U.S. Patent No. 8545640). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8545640

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