The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Jun. 01, 2007
Applicants:
Jiro Higashijima, Koshi, JP;
Naoyuki Okamura, Koshi, JP;
Kousuke Maeda, Koshi, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); F16K 1/30 (2006.01); F16K 31/00 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a processing apparatus including a diaphragm valve provided on a process gas discharge line for discharging a process gas from a processing chamber and configured to control the internal pressure of the processing chamber by adjusting the opening of the diaphragm valve, an antistatic agent source is connected to the process gas discharge line at a position upstream of the diaphragm valve. Damage of a diaphragm valve element due to spark discharge resulted from electric charge generated by friction between the gas flowing through the diaphragm valve and the diaphragm valve element can be prevented.