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For the Inventor, By the Inventor

Kanagawa, Japan

Naoya Shimoju

This inventor holds 25 USPTO granted patents and 19 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Fujifilm Corporation. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoya Shimoju. Retrieved from https://idiyas.com/inventor/naoya-shimoju

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kanagawa, JP (2016 - 2020)
  • Shizuoka, JP (2020)
  • Haibara-gun, JP (2022 - 2024)

Company Filing History:

goldMedal25 out of 16,980 
 
Fujifilm Corporation
 patents

Years Active: 2016-2026

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Areas of Expertise:
Curable Composition
Imprinting Method
Pattern Formation
Polarizing Plate
Liquid Crystal Display
Resist Composition
Adhesive Film
Semiconductor Element
Optical Film
Manufacturing Method
Cured Product
Kit
25 patents (USPTO):Explore Patents
1. 12662559 - Curable composition for imprinting, cured substance, imprint pattern producing method, and method for manufacturing device (2026-06-23),
2. 12497469 - Composition for forming pattern, kit, pattern producing method, pattern, and method for manufacturing semiconductor element (2025-12-16),
3. 12421343 - Composition for forming underlayer film for imprinting, method for producing composition for forming underlayer film, kit, pattern producing method, and method for manufacturing semiconductor element (2025-09-23),
4. 12379658 - Curable composition for imprinting, method for producing curable composition for imprinting, cured product, pattern producing method, and method for manufacturing semiconductor element (2025-08-05),
5. 12242185 - Curable composition, kit, interlayer, laminate, imprint pattern producing method, and method for manufacturing device (2025-03-04),
6. 12109752 - Composition for forming underlayer film in imprinting method, kit, pattern producing method, laminate, and method for manufacturing semiconductor element (2024-10-08),
7. 11899361 - Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same (2024-02-13),
8. 11710641 - Kit, composition for forming underlayer film for imprinting, pattern forming method, and method for manufacturing semiconductor device (2023-07-25),
9. 11441053 - Composition for forming adhesive film for imprinting, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate (2022-09-13),
10. 11401361 - Curable composition for imprinting, cured product, pattern forming method, lithography method, pattern, mask for lithography, and polymerizable composition for imprinting (2022-08-02),
11. 11299653 - Composition, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate (2022-04-12),
12. 10564338 - Polarizing plate, liquid crystal display device having the same, and method of manufacturing polarizing plate (2020-02-18),
13. 10551739 - Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition (2020-02-04),
14. 10457792 - Polarizing plate protective film, polarizing plate, and display device (2019-10-29),
15. 10338277 - Polarizing plate protective film, polarizing plate, and display (2019-07-02),

Certainly! Here is the article about inventor Naoya Shimoju:

Title: Innovator Spotlight: Naoya Shimoju Revolutionizing Semiconductor Manufacturing in Kanagawa, JP

Introduction:

In the bustling region of Kanagawa, JP, visionary inventor Naoya Shimoju is making waves in the world of semiconductor manufacturing with his cutting-edge patents and innovative solutions.

Latest Patents:

Naoya Shimoju has an impressive portfolio of 18 patents, with his latest creations focusing on the development of essential tools for the semiconductor industry. His patents include a groundbreaking kit for imprinting, composition for forming underlayer film, pattern forming method, and a method for manufacturing semiconductor devices.

Career Highlights:

Currently employed at Fujifilm Corporation, Naoya Shimoju's contributions have significantly impacted the industry. His expertise in developing compositions for adhesive films, laminates, and cured product patterns has streamlined manufacturing processes and improved product quality across the board.

Collaborations:

In his journey towards excellence, Naoya Shimoju has collaborated with esteemed colleagues such as Nobutaka Fukagawa and Mayumi Nojiri. Together, they have worked on various projects aiming to push the boundaries of innovation in semiconductor manufacturing.

Conclusion:

Naoya Shimoju's groundbreaking work in semiconductor technology showcases his dedication to advancing the field. His patents and inventions continue to shape the future of the industry, earning him a well-deserved reputation as a trailblazer in Kanagawa, JP.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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