The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Sep. 13, 2021
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 290/12 (2006.01); B29C 59/02 (2006.01); B29K 33/00 (2006.01); B29K 707/00 (2006.01); B29L 31/34 (2006.01); C08F 299/00 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C08F 290/126 (2013.01); B29C 59/026 (2013.01); C08F 299/00 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); B29K 2033/08 (2013.01); B29K 2707/00 (2013.01); B29K 2995/0003 (2013.01); B29L 2031/3406 (2013.01);
Abstract
Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.