The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Sep. 16, 2021
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Yuichiro Goto, Shizuoka, JP;

Naoya Shimoju, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 20/10 (2006.01); G03F 7/00 (2006.01); H01L 21/306 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C08F 20/10 (2013.01); G03F 7/0002 (2013.01); H01L 21/30604 (2013.01); H01L 21/32139 (2013.01);
Abstract

A composition for forming a pattern for imprinting, which contains a polymerizable compound, a photopolymerization initiator, and an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, in which the organic halogen compound is a compound which is stable to light of a mercury lamp, and a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern; a kit including the composition for forming a pattern; a pattern producing method; a pattern; and a method for manufacturing a semiconductor element.


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