Naoki Sasahara

Title: Naoki Sasahara: Innovator in Photosensitive Resin Technology

Introduction

Naoki Sasahara is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 9 patents. His work has been instrumental in advancing methods for producing touch panels and other applications.

Latest Patents

Sasahara's latest patents include innovative methods and compositions such as a method for forming a resin cured film pattern, a photosensitive resin composition, a photosensitive element, and a method for producing touch panels. The method for forming a resin cured film pattern involves creating a photosensitive layer on a base material, which is then cured and processed to form a specific pattern. This process utilizes a photosensitive resin composition that includes a binder polymer with a carboxyl group, a photopolymerizable compound, and a photopolymerization initiator.

Career Highlights

Throughout his career, Naoki Sasahara has worked with notable companies such as Hitachi Chemical Company, Ltd. and Hitachi Medical Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in resin technology.

Collaborations

Sasahara has collaborated with esteemed colleagues, including Ikuo Mukai and Yasuharu Murakami. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Naoki Sasahara's contributions to the field of photosensitive resin technology have established him as a key figure in innovation. His patents and collaborative efforts continue to influence the industry and pave the way for future advancements.