The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Aug. 11, 2005
Katsutoshi Itagaki, Hitachi, JP;
Naoki Sasahara, Hitachi, JP;
Takuji Abe, Hitachi, JP;
Yoshiki Ajioka, Hitachi, JP;
Katsutoshi Itagaki, Hitachi, JP;
Naoki Sasahara, Hitachi, JP;
Takuji Abe, Hitachi, JP;
Yoshiki Ajioka, Hitachi, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Abstract
The invention provides a photosensitive resin composition that can form resists with excellent adhesiveness for conductive layers and that does not easily produce conductive layer discoloration, as well as a photosensitive film employing the composition. A preferred photosensitive film () according to the invention comprises a support (), resin layer () and protective film (), where the resin layer () is composed of a photosensitive resin composition comprising a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a benzotriazole derivative represented by the following general formula (1). [wherein Rand Reach independently represent hydrogen or a monovalent organic group, and Rrepresents a halogen atom, an alkyl, cycloalkyl, allyl, aryl, amino, alkylamino, nitro, cyano, mercapto, alkylmercapto, hydroxyl, hydroxyalkyl, carboxyl, carboxyalkyl, acyl or alkoxy group or a monovalent group with a heterocyclic ring, with the proviso that at least one of Rand Ris an optionally substituted aryl group or an organic group containing a C10 or greater hydrocarbon group.]