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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9971244 B1

PDFFull Text
Date of Patent:
May. 15, 2018

Filed:

Apr. 22, 2014

Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component

Applicant:

Hitachi Chemical Company, Ltd., Tokyo, JP;

Inventors:

Naoki Sasahara, Tokyo, JP;

Ikuo Mukai, Tokyo, JP;

Mayumi Sato, Tokyo, JP;

Yasuhiro Seri, Tokyo, JP;

Koji Abe, Tokyo, JP;

Manami Kiryu, Tokyo, JP;

Assignee:

HITACHI CHEMICAL COMPANY, LTD., Tokyo, JP;

Attorney:

Fitch, Even, Tabin & Flannery, LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/34 (2006.01); G03C 1/805 (2006.01); G03F 7/027 (2006.01); B32B 37/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H05K 3/28 (2006.01); H05K 3/00 (2006.01); H05K 3/46 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); B32B 37/003 (2013.01); G03C 1/805 (2013.01); G03F 7/027 (2013.01); G03F 7/161 (2013.01); G03F 7/20 (2013.01); G03F 7/34 (2013.01); G03F 7/343 (2013.01); B32B 2457/208 (2013.01); G06F 2203/04103 (2013.01); H05K 3/0079 (2013.01); H05K 3/28 (2013.01); H05K 3/4685 (2013.01); H05K 2203/066 (2013.01);
Abstract

A photosensitive elementcomprises a support film, a protective film (polypropylene film), and a photosensitive layerwhich is arranged between the support filmand the protective film, wherein the protective filmhas a principal surfaceat a side of the photosensitive layerand a principal surfaceat an opposite side of the principal surface, and the principal surfaceand the principal surfaceare smooth.

Find Patent Forward Citations

Sasahara, Naoki. (2018). Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component (U.S. Patent No. 9971244). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9971244

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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