Hitachi Chemical Company, Ltd.

Hitachi Medical Co., Ltd.

Naoki Sasahara

Ikuo Mukai

Hiroshi Yamazaki

Yasuharu Murakami

Yoshimi Igarashi

Mayumi Sato

Koji Abe

Katsutoshi Itagaki

Yoshiki Ajioka

Katsunori Tsuchiya

Takuji Abe

Yasuhiro Seri

Manami Kiryu

Tetsuya Yoshida

Akio Nakano

The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 &#x3bc;m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.

Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured film

In the method for forming a protective coat on an electrode for a touch panel according to the invention, a photosensitive layer comprising a photosensitive resin composition containing a binder polymer having a carboxyl group and an acid value of 30 to 120 mgKOH/g, a photopolymerizable compound having at least three ethylenic unsaturated groups, and a photopolymerization initiator, is formed on a base material having an electrode for a touch panel, prescribed sections of the photosensitive layer are cured by irradiation with active light rays and then the sections other than the prescribed sections are removed, to form a protective coat comprising the cured sections of the photosensitive resin composition covering all or a portion of the electrode.

Method of forming protective film for touch panel electrode photosensitive resin composition and photosensitive element, and method of manufacturing touch panel

A photosensitive elementcomprises a support film, a protective film (polypropylene film), and a photosensitive layerwhich is arranged between the support filmand the protective film, wherein the protective filmhas a principal surfaceat a side of the photosensitive layerand a principal surfaceat an opposite side of the principal surface, and the principal surfaceand the principal surfaceare smooth.

Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component

Method of forming protective film for touch panel electrode, photosensitive resin composition and photosensitive element, and method of manufacturing touch panel

The invention provides a photosensitive resin composition that can form resists with excellent adhesiveness for conductive layers and that does not easily produce conductive layer discoloration, as well as a photosensitive film employing the composition. A preferred photosensitive film () according to the invention comprises a support (), resin layer () and protective film (), where the resin layer () is composed of a photosensitive resin composition comprising a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a benzotriazole derivative represented by the following general formula (1). [wherein Rand Reach independently represent hydrogen or a monovalent organic group, and Rrepresents a halogen atom, an alkyl, cycloalkyl, allyl, aryl, amino, alkylamino, nitro, cyano, mercapto, alkylmercapto, hydroxyl, hydroxyalkyl, carboxyl, carboxyalkyl, acyl or alkoxy group or a monovalent group with a heterocyclic ring, with the proviso that at least one of Rand Ris an optionally substituted aryl group or an organic group containing a C10 or greater hydrocarbon group.]

Photosensitive resin composition and photosensitive film made with the same

A permanent resist obtained by at least photoexposure and alkali development of a photosensitive resin composition, the permanent resist containing a metal carboxylate group, or a carboxyl group (a carboxyl anhydride group is also included among a carboxyl group according to the invention) and a metal carboxylate group, wherein an alkaline earth metal carboxylate group constitutes at least 30 mole percent of the total of a carboxyl group and a metal carboxylate group.

Permanent resist, permanent resist-laminated substrate and process for producing the same

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Hitachi, Japan

Naoki Sasahara