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For the Inventor, By the Inventor

Suwon-si, South Korea

Myeong-Cheol Kim

USPTO Granted Patents = 69 

Average Co-Inventor Count = 4.4

ph-index = 11

Forward Citations = 426(Granted Patents)


Inventors with similar research interests:


Location History:

  • Kyonggi-do, KR (2003)
  • Suwon, KR (2002 - 2013)
  • Gyeonggi-do, KR (2006 - 2016)
  • Suwon-si, KR (2003 - 2023)

Company Filing History:

goldMedal69 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2002-2025

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69 patents (USPTO):
1. 12261087 - Methods of manufacturing semiconductor devices by etching active fins using etching masks and forming source/drain layers on the active fins (2025-03-25),
2. 11830775 - Methods of manufacturing semiconductor devices by etching active fins using etching masks (2023-11-28),
3. RE49375 - Field effect transistor having fin base and at least one fin protruding from fin base (2023-01-16),
4. 11302585 - Methods of manufacturing semiconductor devices by etching active fins using etching masks (2022-04-12),
5. RE48367 - Field effect transistor having fin base and at least one fin protruding from fin base (2020-12-21),
6. 10651179 - Integrated circuit device and method of manufacturing the same (2020-05-12),
7. 10629604 - Method of manufacturing semiconductor device having stressor (2020-04-21),
8. 10615080 - Methods of manufacturing semiconductor devices by etching active fins using etching masks (2020-04-07),
9. 10304840 - Semiconductor device having stressor and method of manufacturing the same (2019-05-28),
10. 10109532 - Methods of manufacturing finFET semiconductor devices (2018-10-23),
11. 10014304 - Integrated circuit device and method of manufacturing the same (2018-07-03),
12. 9653363 - Methods of fabricating FinFET semiconductor devices including dummy structures (2017-05-16),
13. 9627542 - Semiconductor device and method for fabricating the same (2017-04-18),
14. 9508727 - Integrated circuit device and method of manufacturing the same (2016-11-29),
15. 9508644 - Method of forming a pattern (2016-11-29),

Title: Innovations in Semiconductor Manufacturing: The Contributions of Myeong-Cheol Kim

Introduction

Myeong-Cheol Kim, a prominent inventor based in Suwon-si, South Korea, has made significant strides in the field of semiconductor manufacturing. With an impressive portfolio of 68 patents, Kim has been at the forefront of technological advancements, focusing on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Among his latest contributions is a groundbreaking patent on "Methods of manufacturing semiconductor devices by etching active fins using etching masks." This method involves the formation of multiple active fins on a substrate, utilizing strategically positioned etching masks to achieve precise removal of materials. The process enhances the fabrication of field-effect transistors by ensuring optimal alignment and structural integrity of the active fins. Another notable patent focuses on field-effect transistors featuring a fin base with extended fin portions, significantly improving device performance.

Career Highlights

Myeong-Cheol Kim has held key roles at renowned organizations, including Samsung Electronics Co., Ltd. His tenure at such leading firms has allowed him to impact the semiconductor industry profoundly, driving innovative designs and manufacturing processes that lead to more efficient electronic devices.

Collaborations

Throughout his career, Kim has collaborated with esteemed colleagues, including Cheol Kyu Kim and Jin-wook Lee. These partnerships have facilitated the exchange of ideas and expertise, further propelling advancements in semiconductor technologies.

Conclusion

Myeong-Cheol Kim's dedication to innovation in semiconductor manufacturing makes him a noteworthy figure in the field. His extensive patent portfolio and collaborative efforts with industry experts reflect a commitment to advancing technology. As the industry continues to evolve, Kim's contributions will undoubtedly play a crucial role in shaping the future of semiconductor devices.

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