Mitsuru Ushijima

Title: The Innovative Contributions of Mitsuru Ushijima

Introduction

Mitsuru Ushijima is a prominent inventor based in Tama, Japan, known for his significant contributions to substrate processing and anodic oxidation technologies. With a total of 12 patents to his name, Ushijima has made a lasting impact in the field of materials processing.

Latest Patents

One of Ushijima's latest patents is a substrate processing method that involves arranging a substrate in a chamber and introducing hydrogen gas (Hgas) and oxygen gas (Ogas) independently into a catalyst reaction portion. This innovative method allows for the efficient processing of substrates by controlling the flow rates of the gases. Another notable patent is for an anodic oxidation apparatus, which treats large target substrates using a smaller component. This apparatus includes a lamp that emits light, a treatment bath, and a cathode electrode, all designed to enhance the anodic oxidation process for display device manufacturing.

Career Highlights

Ushijima has worked with notable companies such as Tokyo Electron Limited and Tel Kyushu Limited, where he has honed his skills and contributed to various technological advancements. His work has been instrumental in developing methods that improve substrate processing and anodic oxidation techniques.

Collaborations

Throughout his career, Ushijima has collaborated with esteemed colleagues, including Masami Akimoto and Kiyohisa Tateyama. These partnerships have fostered innovation and have led to the successful development of new technologies in the field.

Conclusion

Mitsuru Ushijima's innovative work and numerous patents highlight his significant role in advancing substrate processing and anodic oxidation technologies. His contributions continue to influence the industry and inspire future innovations.