The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1991
Filed:
Feb. 10, 1989
Mitsuru Ushijima, Tokyo, JP;
Masami Akimoto, Kikuchi, JP;
Tokyo Electron Limited, Tokyo, JP;
Tel Kyushu Limited, Kumamoto, JP;
Abstract
An apparatus is disclosed which forms a photo-resist film on a substrate surface and/or develops it. A passage provided such that it extends in a predetermined direction to allow conveying of a substrate having a surface on which a photoresist film is to be formed or a substrate having a photo-resist film to be developed, a plurality of treating units necessary for forming a photo-resist film and/or a plurality of treating units necessary for developing the photo-resist film, these units being provided along the passage, conveying means movable along a predetermined course for conveying the substrate in a predetermined direction, substrate handling means provided on the conveying means for holding a substrate and for setting a substrate into the treating unit, said substrate handling means being movable and rotatable in any direction, and control means for selecting said plurality of treating units in any combination and for controlling operations of the conveying means and substrate handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.